Best Solutions for Supporting Fabrication of Cutting-edge Semiconductor Devices

Preface

Best Solutions for Supporting Fabrication of Cutting-edge Semiconductor Devices

Wasuke Nakano

Featured Articles

Prospects for Si Semiconductor Devices and Manufacturing Technologies in Nanometer Era

Ryuta Tsuchiya, Dr. Eng. / Masaru Izawa / Shinichiro Kimura, Dr. Eng.

Current Status and Outlook of 3D Inspection Analysis for Semiconductor Devices
—Efforts Towards Smart Route-cause Analysis by New Measurement and Analysis Technology—

Aritoshi Sugimoto / Yukio Kembo / Kenji Watanabe, Ph. D. / Toshie Yaguchi, Ph. D.

New World of CD-SEM in Utilization of Design Data

Isao Kawata / Norio Hasegawa / Sho Takami

Failure Analysis System for Submicron Semiconductor Devices

Munetoshi Fukui / Yasuhiro Mitsui, Ph. D. / Yasuhiko Nara / Fumiko Yano, Ph. D. / Takashi Furukawa, Dr. Sci.

High-sensitivity, High-speed Dark-field Wafer-defect Inspection System—IS3000

Shigeru Abe / Takuaki Sekiguchi / Hiroyuki Nakano, Dr. Eng. / Minori Noguchi

Scanning Surface Inspection System with Defect-review SEM and Analysis System Solutions

Hideo Ota / Masayuki Hachiya / Yoji Ichiyasu / Toru Kurenuma

Micro-fabrication and High-productivity Etching System for 65-nm Node and Beyond

Takashi Tsutsumi / Masanori Kadotani / Go Saito / Masahito Mori

Vertical Diffusion and CVD Tool for Next-generation Semiconductor Devices

Masakazu Shimada / Mitsuhiro Hirano / Takahiro Maeda / Jie Wang

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